Electron Beam Lithography
The Nanobeam nB5 EBL instrument has been installed and is currently being commissioned (expected completion date Summer 2017).
The new electron beam lithography (EBL) facility is a suite of cleanrooms that is part of the nmRC, the EBL tool is a Nanobeam nB5 and will provide researchers with the following capabilities:
- Electron beam lithography on flat, smooth substrates (e.g. semiconductor, glass, quartz) from 10mm x 10mm pieces to 25mm glass coverslips to 72mm diameter wafers.
- Linewidths > 10nm; beam currents from 500pA to 15nA at 80kV with a 50MHz scan speed.
- nB5 draws the pattern in 500 micron x 500 micron square fields which are stitched together with sub-20nm accuracy to form the complete pattern. Alignment to an existing pattern is accurate to < 20nm.
Research areas it will initially be targeted at:
- Direct patterning of bioscience-relevant self-assembled monolayers (e.g. PGMI)
- Plasmonic structures
- Photonic structures
- Sub-micron electronic devices
For further information or to discuss potential projects please contact: Dr Chris Mellor (email@example.com) or Prof. Matt Clark (firstname.lastname@example.org).