Nanofabrication and Characterisation
Innovative and cost effective nanofabrication technologies at the University of Nottingham include Electrostatic Spray Assisted Vapour Deposition (ESAVD), modifed atomic layer deposition for the generation of monolayer functional thin films, laser assisted deposition for cost effective patterning and nanostructured 3-D micro-objects, CVD for hydrogen storage and surface engineering, and PVD/thermal spraying for surface modification and patterning. An extensive suite of clean rooms housing several MBE machines and processing equipment is used for the fabrication of semiconductor heterostructures and nanostructures.
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