Pioneering multilayer nitride dielectrics: a new materials architecture for ultra-high-voltage electronics

This exciting opportunity is based within the Thin Films Lab - Advanced Materials research group - in the Faculty of Engineering, University of Nottingham, which conducts cutting-edge research into next-generation electronic and energy materials for Net Zero technologies such as electrified transport, power electronics and energy conversion.

Vision

We are seeking a highly motivated and ambitious PhD researcher who is excited by fundamental materials science and its application to real-world technologies. This project aims to redefine how dielectric failure is understood and controlled, introducing a new architecture-led design approach rather than relying on incremental optimisation of existing materials.

By developing novel multilayer dielectric materials with ultra-high breakdown strength, the research will revolutionise electrified technologies, enabling operation at substantially higher power densities, voltages and temperatures. This capability will unlock more compact, efficient and robust electronic and power systems, directly supporting future electrification and Net Zero ambitions. 

Motivation 

The project addresses a critical bottleneck in modern electronics: dielectric breakdown limits in thin-film insulators. As technologies such as fast EV charging, electric aircraft, compact power modules and renewable-energy converters push to ever-higher operating voltages, conventional dielectric materials are reaching their fundamental limits. Further progress through incremental optimisation of conventional materials is becoming increasingly marginal.

This project is motivated by a fundamentally different design philosophy. Rather than viewing dielectric breakdown as a bulk material limitation, it will develop novel multilayer composite materials with ultra-high dielectric breakdown strength, using the multilayer architecture itself as a new and largely unexplored control parameter in nitride dielectric thin films.

By deliberately engineering nanoscale interfaces, multilayer structures offer a powerful route to control electric-field distribution and influence the initiation and propagation of breakdown pathways. This architecture-led approach represents a new concept in dielectric design and provides a scientifically robust route to step-change improvements in performance for next-generation electronic and power systems.

Aim

You will have the opportunity to design, fabricate and study novel multilayer composite dielectric materials with ultra-high breakdown strength, gaining hands-on experience in advanced thin-film deposition and nanoscale electrical characterisation. The project will allow you to develop a deep, mechanistic understanding of how interfaces and architecture govern dielectric failure under extreme electric fields.

You will work within the Advanced Materials research group in the Faculty of Engineering and be supervised by a team of internationally recognised experts: Dr Zakhar Kudrynskyi, Professor David Grant, and Dr Timothy Cooper. Together, the supervisory team brings complementary expertise in thin-film growth, functional and dielectric materials, and advanced nanoscale characterisation. You will also work closely with industrial partners in advanced instrumentation.

With access to a substantial travel budget, you will have multiple opportunities for international research visits with project collaborators abroad - including France and Germany - as well as the opportunity to present your research at leading international conferences in the UK and worldwide.
The skills and expertise developed during this PhD will prepare you for careers in academic research, high-technology industries, power electronics, semiconductor R&D, or advanced materials and instrumentation while providing a strong foundation for further research-led funding and fellowship opportunities.

Candidate requirements

An enthusiastic, self-motivated candidate with a 1st or high 2:1 degree in engineering, physical sciences or a related science discipline. Prior experience in thin-film deposition, microscopy, spectroscopy, electronics or coding is advantageous but not essential; full training will be provided.

Eligibility and funding

This studentship is open to UK/home and international candidates. 

After a suitable candidate is found, funding is sought from the University of Nottingham as part of a competitive process. This will cover home tuition fees and UKRI stipend.

PhD start date: October 2026

How to apply

Application deadline: 9 March 2026

To apply, please email your CV and supporting statement to Zakhar Kudrynskyi at zakhar.kudrynskyi@nottingham.ac.uk

The University of Nottingham actively supports equality, diversity and inclusion and encourages applications from all sections of society. We - the Faculty of Engineering - provide a thriving working environment for all our postgraduate researchers (PGRs) creating a strong sense of community across research disciplines. We understand that research culture is important to our PGRs so we work closely with our Postgraduate Engineering Society and PGR research group representatives to support and enhance the postgraduate research environment.

As a PGR at the University of Nottingham you will benefit from training through our Researcher Academy’s training programme. Based within the Faculty of Engineering you will have additional access to courses developed specifically for our engineering and architecture PGRs including sessions on how to write a paper, communicating your research, and research integrity. 

We offer dedicated postgraduate study spaces, have outstanding research facilities and work in partnership with leading industrial partners.